III-V Lithography Bay

EVG 620 Mask Aligner
Location: 1.728
*****
*****Description: Double-sided Mask Aligner

****Properties: Mask holder 5inches, Wafer size 2 to 4 inches and pieces. Illumination Wavelength 265nm. Exposure Modes: soft *****contact, hard contact, Vaccum contact , Proximity

*****Compatible Materials: No Restrictions

*****Incompatible Materials:

  1. Log on the system via Lab Access
  2. Make sure that the power is 500W, the UV light is on
  3. Start the EV620.exe program
  4. Logon
  5. Open recipe 1 (for top alignment) or recipe 2 (for bottom alignment). Check the parameter and run.
  6. Follow the steps by steps procedure given by the software
  7. Exit the program when done. Log off from lab access.
  8. The system should stay on (power, light).