Diffusion Bay4" Field Oxide (Undoped) - Brute
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| ***** *****Description: Brute Atmospheric Furnace, Piranha Clean Required (unless wafer is coming out of diffusion tube) *****Compatible Materials: Si/SiGe, Doping < 1x1018cm-3; N/N+ or P/P+, General purpose oxidation (wet or dry) and annealing. *****Incompatible Materials: III-V / Hi K |
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| 1. Log on to the tool using the LabAccess terminal. 12. Log off of the tool using the LabAccess terminal. |
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