Diffusion Bay

4" Gate Oxide - Brute
Location: 1.756

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Description: Brute Atmospheric Furnace, Piranha Clean Required (unless wafer is coming out of diffusion tube)

*****Compatible Materials: Si/SiGe, Undoped wafers - Gate oxidation (wet or dry)

*****Incompatible Materials: III-V / Hi K
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1. Log on to the tool using the LabAccess terminal.
12. Log off of the tool using the LabAccess terminal.