Diffusion Bay

4" Oxide (Undoped) - Brute
Location: 1.756
*****
*****Description: Brute Atmospheric Furnace, Piranha Clean Required (unless wafer is coming out of diffusion tube)

*****Compatible Materials: Si/SiGe, Doping < 1x1018cm-3; N/N+ or P/P+, General purpose oxidation (wet or dry) and annealing.

*****Incompatible Materials: Metals / Hi K / III-V / Photoresist
*****
1. Log on to the tool using the LabAccess terminal.
12. Log off of the tool using the LabAccess terminal.