*****Compatible Materials: Si/SiGe, Doping > 1x10¹³cm^-3; N/N+ or P/P+, General purpose oxidation (wet or dry) and annealing.

*****Incompatible Materials: Metals / Hi K / III-V
*****

1. Log on to the tool using the LabAccess terminal.
2. Go to the recipe loader on the MRL control computer by selecting the apple and choosing process loader.
3. Select the field oxide furnace (4-2).
4. Select the desired recipe (new recipes must be approved and created by the maintenance staff).
5. Enter the desired growth time.
6. Enter run data (user, recipe, deposition time) in log book. 7. Enter MRL control password and select load recipe.
8. Open the tube status window (under the apple icon if not already open).
9. Open the field oxide furnace window.
10. Select control button.
11. Select start.
12. Wait for load/unload step.
13. Place wafers in boat (this should be done on the load platform with clean tools and on cleanroom wipes to prevent contamination of the boat) including buffer wafers to ensure more uniform device wafers.
14. Transfer the boat into the furnace with the rod.
15. Replace furnace cover.
16. Re-open the field oxide furnace status window, select the control button, and select hold to remove the load/unload hold.
17. Wait for the growth to run automatically. 18. Wait for load/unload step.
19. Use rod to remove the boat from the furnace.
20. Replace furnace cover.
21. Re-open the field oxide furnace status window, select the control button, and select hold to remove the load/unload hold.
22. Allow boat and wafers to cool while waiting for recipe to finish running.
23. After process is complete, reopen the process loader under the apple.
24. Select the field oxide furnace.
25. Choose the Idle recipe.
26. Enter MRL control password and select load recipe.
27. Open the field oxide furnace status window.
28. Select control button.
29. Select start.
30. Unload the wafers again using cleanroom wipes and clean tools to prevent contamination to the boat.
31. Log off of the tool using the LabAccess terminal.