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The mission of the Microelectronics Research Center (MRC) at UT-Austin is to perform education and research in electronic materials, devices and processes of interest to the semiconductor integrated circuit and optoelectronics industries. In the silicon area, MRC has developed new approaches to scaling classical transistors to deep submicron geometries, resulting in high levels of integration, reliability, and performance in integrated circuits. These include silicon heterostructure, high mobility and nanowire transistors, and carbon electronics. There have been breakthroughs in silicon-based microelectromechanical systems for chemical detection, and organic electronics, which have led to technology spin-offs. The optoelectronics group at MRC has developed novel vertical-cavity and quantum cascade lasers, solar cells and radically new photodetectors based on GaN and related materials.
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The MRC laboratories reach users from many different fields: electronics, optics, physics, chemistry, astronomy, as well as chemical, mechanical, and petroleum engineering. Lab users are both from universities and cooporates. The MRC is more than a clean room with open-access to advanced nano-fabrication equipment – it isa community of scientists who work together to built advanced technology products and knowledge.
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The MRC NNIN facilities include 12,000 sq. ft. of class 100 and class 1000 clean-room space for Si, III-V and soft materials processing. The clean room contains a JEOL-6000FS/E-based electron beam lithography system capable of 20nm resolution on masks, small substrate pieces upt to 8" wafers. The e-beam system is also used to generate master for the Step and Flash imprint lithography equipment. The S-FIL is a nano-imprint scheme for patterning of features in sub-20nm regime with ability to perform layer-to-layer alignment through a transparent template to sub-tenth micron accuracy.
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The other micro/nano-fabrication facilities include sputter, e-beam and plasma deposition for metals, silicides and dielectrics, reactive-ion etching, rapid thermal processing and oxidation/diffusion furnaces for Si, Si-Ge and High-k dielectrics, LPCVD for poly-silicon, oxides, nitrides and numerous wet chemistry stations. The characterization laboratories contain the apparatus for comprehensive optical and electrical measurements.
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Additionally, a PC-based system using National Instrument LABVIEW to control and monitor the usage of all the tools in the clean room. Each MRC user has lab-access for equipment for which he has been qualified to use.
A professional and experienced cadre of facilities and equipment technicians and engineers who maintain the tools and provide training to new users are able to support your project and handle your project entirely in close collaboration with you.
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