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Upcoming Events & Presentations:



Texas-Austin: Plasma-Therm Technical Workshop

Fundamentals of Plasma Processing (Etching and Deposition)

The University of Texas at Austin

10100 Burnet Road, Commons Learning Center

28 September 2012 (Friday), 8:00am to 5:30pm


The workshop will focus on the fundamentals of plasma etching and deposition. Lectures will include the basics of plasma reactors and mechanisms for etching and deposition and review state-of-the-art etching and deposition technologies as applied to semiconductor, MEMS, and nanofabrication. Talks will cover compound semiconductor, dielectric, and deep silicon etching as well as PECVD and high density plasma CVD of silicon based materials. Fundamental and new ideas for endpoint detection and sample thermal budget management will be presented.

 

Registration is free, however online pre-registration is requested by September 14th. Please reserve your sport for this full day event by completing the Registration Form and returning to Christine Wood at  This e-mail address is being protected from spambots. You need JavaScript enabled to view it or 512-965-6671


Objectives

  • Learn the fundamentals of plasma, reactors, and etching mechanisms
  • Review current etching technologies for deep silicon etching, compound semiconductors, and dielectrics
  • Provide essentials of PECVD and HDPCVD
  • Explore the fundamentals and new ideas in endpoint detection
  • Understand thermal budget considerations

Continental breakfast and lunch will be provided

Scheduled details and speaker information follows:

Program

7:30 am  -     8:00 am     Registration and light breakfast (provided by Plasma-Therm)

8:00 am  -     8:15 am     Welcome

8:15 am  -     9:45 am     Basics: Plasma and Reactors

9:45 am  -   10:00 am     Break

10:00 am  - 11:00 am     Plasma Etching Mechanisms

11:00 am  -   2:00 pm     Dielectric Etching

12:00 pm  -  1:00 pm     Networking Lunch (provided by Plasma-Therm)

1:00 pm  -    2:00 pm     Compound Semiconductor Etching

2:00 pm  -    2:45 pm     Deep Silicon Etching

2:45 pm  -    3:00 pm     Break

3:00 pm  -    3:30 pm     Endpoint Basics

3:30 pm  -    4:00 pm     Thermal Budget Management

4:00 pm  -    5:15 pm     PECVD and HDP CVD (high density plasma CVD

5:15 pm  -                      Q&A

 

Speaker Information:  David Lishan, Ph.D.

 

David Lishan


David Lishan received his Bachelor’s degree in Chemistry from UC, Santa Cruz and M.S. and Ph.D. from UC, Santa Barbara in Solid State Electrical Engineering. During his career he has worked and published on wide range of material, semiconductor, and chemistry R&D projects in the areas of photochemistry, x-ray mask fabrication, PVD, and plasma processing. He joined Plasma-Therm nearly 14 years ago and currently holds the position of Principal Scientist and Director in the Technical Marketing Group. His primary focus is on the application of plasma processing for MEMS, photonics, data storage, and compound semiconductor applications. He holds two patents in the area of semiconductor processing and over 60 publications and conference presentations.

 

Plasma-Therm has recently organized and presented plasma processing workshops at Harvard University, UC Berkeley, University of Notre Dame, UC Los Angeles (UCLA), University of South Florida, and in Israel.

 

 


 

NNIN/MRC Workshop

ALD roadshow from J Provine (Stanford University)
Thursday Oct 11th 2012, 9:00am-5:00pm
Microelectronics Research Center - JJ Pickle Campus
Conference room MRC 2.114,
10100 Burnet Road, Bldg # 160
Austin, Texas 78758

 

Abstract

Prof. Sanjay Banerjee is pleased to host the MRC/NNIN Atomic Layer Deposition roadshow.

Stanford NanoFabrication Facility has currently three Cambridge Nanotech ALD chambers (two PE-ALD chambers and one thermal ALD). The Stanford's ALD guru, J Provine, will give talks on the basics of ALD, a deeper dive into ALD precursors and applications, and details on the SNF's ALD processes and characterization, present and future.

Please reserve your sport for this full day event by completing the Registration Form and returning to Christine Wood at  This e-mail address is being protected from spambots. You need JavaScript enabled to view it or 512-965-6671

Lunch will be provided for registered attendees.


Speaker

J Provine, Research Associate Dept. of Electrical Engineering, Stanford

This e-mail address is being protected from spambots. You need JavaScript enabled to view it

 

Contacts

Marylene Palard, NNIN MRC coordinator,

This e-mail address is being protected from spambots. You need JavaScript enabled to view it , (512) 658-2668

Christine Wood, MRC Administrative Associate

This e-mail address is being protected from spambots. You need JavaScript enabled to view it , (512) 232 9007

 

Tentative Schedule: Thursday October 11th, 2012

9:00-9:05

Welcome by the MRC Director

Sanjay K Banerjee

9:05-9:15

Meet with the different participants

 

9:15-10:15

Cleanroom tour: Fidji and Cambridge ALDs

UT Grads, M Palard

10:15-10:30

Coffee Break

 

10:30-12:00

Intro to ALD

J Provine

12:00-13:00

Lunch Break.

 

13:00-14:30

A deeper dive in ALD and thin film metrology

J Provine

14:30-15:45

Break

 

15:45-16:45

Presentations of UT ALD processes (MgO, BeO)

Discussions

UT Grads

16:45-17:00

Questions & Answers

 

 

 

 

 


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