E-Beam Lithography

Contact Information:

Sanjay K. Banerjee, Center Director

Cockrell Family Regents Chair #4

10100 Burnet Road

Bldg 160, MER 1.606 B, R9900

Austin, TX 78758

Tel : 512-471-6730 Fax: 512-471-8420

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Bill Ostler, E-Beam Training

10100 Burnet Road

Bldg 160, MER 2.604 A, R9950

Austin, TX 78758

Tel : 512-475-6713

Fax: 512-471-5625

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Overview

The Jeol JBX6000 electron beam lithography tool  at the Microelectronic Research Center  is available for use by outside users. The system is capable of patterning small wafer samples, 4" substrates, and a 6" diameter on an 8" substrate. It uses a modulated beam of electrons to define structures with dimensions of 20 nm or larger.  The tool  is equipped with a laser interferometer stage which facilitates precise multilevel lithography, automatic mark detection, layer patterning.  The beam energy is selectable via frequency adjustments up to12MHz at 50kV and the beam current is adjustable from 20nA to 75pA. The Jeol JBX6000 system can be used for mesoscopic, quantum device fabrication, or other ultra high resolution patterning.

Training/Certification

A 12 hour training class is required for all new users at a cost of $50/hour. Classes are offered by appointment only at the Microelectronic Research Center and can be scheduled by contacting Bill Ostler This e-mail address is being protected from spambots. You need JavaScript enabled to view it . The training consists of 4-5 hours of GDS cad file conversions to JDF, SDF, and exposure setup files. The following day will consist of hands on training in the clean room at the tool. The trainee will be given the opportunity to actually load wafers, calibrate the gun alignment, focus an astigmatism, setup the current, run the user interface, and complete an exposure. Pattern stitching, automatic mark detection, chemical processes are not covered in this course.

Clean room safety course will be required of all users.

*** Please note that efficient use of the system will require several additional hours of practice with an experienced user.

Availability

The facility is available from 8:00am to 5:00pm M-F or on an as needed basis with special access arrangements.

Materials

All user's are required bring their own substrates with the exception of the training classes.

Usage Fees

Contact  ( This e-mail address is being protected from spambots. You need JavaScript enabled to view it '; document.write( '' ); document.write( addy_text151 ); document.write( '<\/a>' ); //--> This e-mail address is being protected from spambots. You need JavaScript enabled to view it ) for more information.