E-Beam Lithography
Contact Information
Sanjay
K. Banerjee, Center Director
Cockrell
Family Regents Chair #4
10100 Burnet Road
Bldg 160, MER 1.606 B, R9900
Austin, TX 78758
Tel : 512-471-6730
Fax: 512-471-8420
banerjee@ece.utexas.edu
Bill
Ostler, E-Beam Training and Facilities Coordinator
10100 Burnet Road
Bldg 160, MER 2.604 A, R9950
Austin, TX 78758
Tel : 512-475-6713
Fax: 512-471-5625
bill@mer.utexas.edu
Overview
The
Jeol JBX6000 electron beam lithography tool at the Microelectronic Research Center is available for use by outside users. The system is capable of patterning small wafer samples, 4" substrates, and a 6" diameter on an 8" substrate. It uses a modulated beam of electrons to define structures with dimensions of 20 nm or larger. The tool is equipped with a laser interferometer stage which facilitates precise multilevel lithography, automatic mark detection, layer patterning. The beam energy is selectable via frequency adjustments up to12MHz at 50kV and the beam current is adjustable from 20nA to 75pA. The Jeol JBX6000 system can be used for mesoscopic, quantum device fabrication, or other ultra high resolution patterning.Training/Certification
A 12 hour training class is required for all new users at a cost of $50/hour Classes are offered by appointment only at the Microelectronic Research Center and can be scheduled by contacting Bill Ostler bill@mer.utexas.edu . The training consists of 4-5 hours of GDS cad file conversions to JDF, SDF, and exposure setup files. The following day will consist of hands on training in the clean room at the tool. The trainee will be given the opportunity to actually load wafers, calibrate the gun alignment, focus an astigmatism, setup the current, run the user interface, and complete an exposure. Pattern stitching, automatic mark detection, chemical processes are not covered in this course.
Clean room safety course will be required of all users.
*** Please note that efficient use of the system will require several additional hours of practice with an experienced user.
Availability
The facility is available from 8:00am to 5:00pm M-F or on an as needed basis with special access arrangements.
Materials
All user's are required bring their own substrates with the exception of the training classes.
Usage Fees
Contact ( bill@mer.utexas.edu ) for more information.
Rules of Operation
Gold and other conductive metals not allowed to be used in the e-beam tool at any time.
No Hi-K Materials.
