The following list of chemicals are supplied by the MRC for local use:

1. Acetone, CMOS
2. Aluminum Etch, 16:1:1:2
3. BOE CMOS (Buffered Oxide Etch) 6:1
4. Hydrochloric Acid, 37% CMOS
5. Hydrofluoric Acid, 49%, CMOS
6. Hydrogen Peroxide, 30% CMOS
7. Isopropyl Alcohol, CMOS
8. Methanol, CMOS
9. Sulfuric Acid, 96%, CMOS
10. Nitric Acid, 70%, CMOS
11. PhotoResist, AZ-5209-E
12. Developer, AZ-726-MIF
13 Nano-Strip solution
14. Transetch N (Nitride etch)