NNIN/MRC Workshop
Fabrication of sub-100nm features with imprint lithography covering a full wafer
March 10th-11th, 2009
Microelectronics Research Center at JJ Pickle Campus
10100 Burnet Road, Bldg # 160,
Austin, Texas 78758
Abstract:
The International Technology Roadmap for Semiconductors (ITRS) has identified several technologies as candidates for future advanced lithography. One of these techniques is the nano-imprint lithography (NIL). The NIL technique performed at MRC is Step and Flash Imprint Lithography (S-FIL™). S-FIL is based on a low viscosity fluid that fills in the cavities of a mold (a 1:1 high resolution quartz mold with features written with Electron-Beam lithography). After UV cure, the mold features are locked onto the substrate with that polymer and are transferred onto the under-layer by successive etching steps.
S-FIL has proven capabilities of forming various geometries including lines, posts, holes, and 3-dimensional tiered structures. The ability to imprint arbitrary geometries has allowed S-FIL to be applied to a number of applications like for example, in biomedicine, optics, magnetic storage,….
In this two days workshop, an introduction to process steps involved in S-FIL (Photolithography, Etching) will be given with lectures. During the two hands-on sessions, attendees will do lab practice by imprinting on IMPRIO100 from Molecular Imprints Inc. as well as by dry etching for transferring sub-100nm imprint patterns into substrate. We will learn how to transfer holes and pillars from the same template by utilizing two imprint resists (A non-Si non-containing monomer and a Si-containing monomer) following by adequate etching processes.
Contacts
Marylene Palard, NNIN MRC program manager, marylene@mer.utexas.edu, (512) 658 2668
Jean L. Toll, Executive Assistant, j.toll@mer.utexas.edu, (512) 471-4493
Speakers
Chris Mack, Professor at the Department of Electrical & Computer Engineering, College of Engineering, UT Austin, chris@lithoguru.com
Chris Jones, Applications Engineer from Molecular Imprints Inc. CJones@molecularimprints.com
Fee
One hundred fifty dollars per person ($150)
Tentative Schedule:
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Tuesday March 10th, 2009 |
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8:00-8:05 |
Welcome by the MRC Director |
Sanjay K Banerjee MRC Director |
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8:05-8:10 |
Review of the day schedule and presentation of the workshop staff members |
Marylene Palard
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8:10-9:10 |
First part lecture on nano-IC Fabrication |
Chris Mack, Professor at UT |
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9:10-9:20 |
Coffee Break (assign group n° and bunny suit size) |
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9:20-10:20 |
Second part lecture on nano-IC Fabrication |
Chris Mack, Professor at UT |
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10:20-10:30 |
Coffee Break |
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10:30-11:30 |
Overview of the Step and Flash Imprint Lithography techniques and applications |
C Jones Molecular Imprints Engineer |
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11:30-12:30 |
Lunch Break. |
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12:30-13:00 |
Hands-on session description |
Marylene Palard |
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13:00-14:30 15:00-16:30 |
Imprinting with SFIL, IMPRIO100 Template 10mmx10mm Mesa with 100nm features Si-Monomat for etch barrier |
Gabriel Glenn Jesse James
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14:30-15:00 |
Break |
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13:00-14:30 15:00-16:30 |
Etching Etch barrier thickness measurement onto Mesa, with Nanospec AFT, recipe 331 Etch barrier + transfer layer + Si etch on RIE Plasma Therm n°2, SEM analysis |
Johnny Jonhson, Marylene Palard |
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16:30-17:00 |
Questions |
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Wednesday March 11th, 2009 |
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8:30-10:30 |
SEM analysis on Zeiss Neon40 |
Marylene Palard Ricardo Garcia |
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10:30-11:30 |
Etching or Imprinting in IMPRIO100
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Johnny Jonhson, Gabriel Glenn Jesse James |
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11:30-12:00 |
Conclusion of the workshop and Survey |
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According to the number of attendees to the workshop we will have maximum 2 groups of maximum 5 persons each.
Each group will go trough all the process steps, by rotation, during the afternoon hands-on session in the cleanroom.
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Imprinting, South Cleanroom |
Group 1 |
Group 2 |
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Etching, North Cleanroom |
Group 2 |
Group 1 |
Last modified: Febuary 2, 2009.
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