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Diffusion Gate Oxide - BRUTE - 4" Tube #5

Equipment Type: 
Diffusion
Equipment Area: 
North Cleanroom
Equipment Location: 
1.756
Description: 

Tube #5 (the middle one, in the rack closest from the cleanroom windows)

Brute Atmospheric Furnace, Piranha Clean Required (unless wafer is coming out of diffusion tube)

Compatible Materials: 
Si / SiGe, Undoped wafers - Gate oxidation (wet or dry)
Incompatible Materials: 
III-V / Hi K
Procedures: 

1. Log on to the tool using the LabAccess terminal.
2. Log off of the tool using the LabAccess terminal.
Used by Tutuc's group once.