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Diffusion Oxide - BRUTE - Undoped - 4"

Equipment Type: 
Diffusion
Equipment Area: 
North Cleanroom
Equipment Location: 
1.756
Description: 

Tube # 3 (bottom tube, second rack: the further away off the cleanroom window)

Brute Atmospheric Furnace, Piranha Clean Required (unless wafer is coming out of diffusion tube)

 

Compatible Materials: 
Si/SiGe, Doping < 1x1018cm-3; N/N+ or P/P+, General purpose oxidation (wet or dry) and annealing.
Incompatible Materials: 
Metals / Hi K / III-V / Photoresist
Procedures: 

1. Log on to the tool using the LabAccess terminal.
2. Log off of the tool using the LabAccess terminal.

Used for Pyrex (that ontains ions) annealing