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E-line Raith - Electron beam lithography
Electron Beam Lithography (EBL)
E-line Raith
Features: This EBL tool consists of a load lock, laser-interferometer controlled stage, six aperture selections,
and a good quality scanning electron microscopy (SEM) capability.
The maximum electron high tension (EHT) is of 30 kV.
Compatible Materials:
No Restrictions
Incompatible Materials:
Highly degassing material or life sample
A training video how to do electron beam lithography using e-line Raith: