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Etcher RIE Oxford 80

Etcher RIE Oxford 80

Silicon Etch
North Cleanroom
1.750
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Description: RIE Etcher

Features: up to 8" wafers
chamber gases: CH4, N2, H2, Ar, CHF3, Cl2, SF6, Ar
cold chuck (-15°C)
turbo pump

Compatible Materials: 
Si / SiGe / Polymer