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Focus Ion Beam FEI 835

Equipment Type: 
Metrology
Equipment Area: 
South Cleanroom
Equipment Location: 
1.404
Description: 

The FEI x835 dualbeam system is capable of- focused ion beam milling with Gallium source,- ion beam deposition and- electron beam deposition/imaging.Deposition materials include Platinum, Molybdenum.

Compatible Materials: 
Size: very small fragments to full 200mm wafers.
Incompatible Materials: 
Magnetique