Process Materials

The following list of chemicals are supplied by the MRC for local use:

  1. Acetone, CMOS
  2. Aluminum Etch, 16:1:1:2
  3. BOE CMOS (Buffered Oxide Etch) 6:1
  4. Developer, MF-26A Microposit
  5. Hydrochloric Acid, 37% CMOS
  6. Hydrofluoric Acid, 49%, CMOS
  7. Hydrogen Peroxide, 30% CMOS
  8. Isopropyl Alcohol, CMOS
  9. Methanol, CMOS
  10. Nano-Strip solution
  11. Nitric Acid, 70%, CMOS
  12. PhotoResist, AZ-5209-E
  13. Sulfuric Acid, 96%, CMOS
  14. Transetch N (Nitride etch) 

Solvents, Acids, Photolithograhy, Oxidizers

Section: