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Etcher Trion Oracle
RIE/ ICP Etcher
Features: Central Vacuum Transport for a full 25 wafer lot
Up to 8inch wafer
Only full size wafer can be loaded. Make sure to place your pieces /coupons on a carrier wafer.
Reactor #2, Chuck with Helium back side cooling (-30°C), ICP head.
Turbo pump on each chambers
RIE quartz etch in Trion Chamber #3
RIE Chrome etch in Trion Chamber #3
The Oracle cluster system consists of two components:
1) Central Vacuum Transport (CVT)
2) 3 “roll-away” process reactors
The “roll-aways” are docked to the CVT in a cluster configuration.
The system is configured with single wafer loading or for full production with vacuum cassette elevators.